The 12V 1200A Copper Plating Rectifier provides 14.4 kW of adjustable DC power for acid copper, alkaline copper and suitable PCB or component-plating tanks. Its high current supports substantial plated area while the 12V range suits many low-voltage bath arrangements.
Electrical contribution to copper deposition
Stable current helps maintain the selected current density and deposition rate across a rack or production batch. With suitable bath chemistry and current distribution, controlled output can support more uniform thickness, surface appearance and coverage. Additives, agitation, anode layout, contacts, part geometry and solution maintenance remain equally important.
Output specification
| DC output | 12V, 1200A |
|---|---|
| Rated power | 14.4 kW |
| Control | Adjustable constant current or constant voltage |
| Cooling | Air or water cooling available |
| Interfaces | Local, remote, PLC and RS485 options |
| Custom range | 1–1000V and 1–100,000A |
Select for the actual copper process
Current is calculated from all simultaneously plated area multiplied by the bath supplier’s current density. PCB panel, through-hole, via-fill, rack and continuous copper plating use different current-distribution strategies. Voltage should be checked under full load, including fixtures, cables and electrode spacing.
DC, pulse and line controls
Many copper baths operate with DC. Pulse or periodic-reverse output can be configured when the process recipe defines forward and reverse peak current, timing and average current. Multi-zone outputs, ampere-hour control, recipes and line-speed coordination are available for automatic equipment.
Explore copper plating rectifiers, browse industrial DC power supplies, or send your bath, area and loaded-voltage data.
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